Used PLASMATHERM / UNAXIS 790 #9375333 for sale

ID: 9375333
Wafer Size: 4"
Inductively Coupled Plasma (ICP) etcher, 4" (8) MFC Gas inputs NESLAB Chiller Turbo pump Roughing pumps Gases used: Freon Oxygen Argon C318 Nitrogen Power supply: 208 V, 60 Hz, 3 Phase.
PLASMATHERM / UNAXIS 790 is an etching/ashersystem developed by UNAXIS/PLASMATHERM for etching and ashing of substrates for advanced packaging applications. The equipment is a compact bench-top platform which utilizes deep reactive ion etching or dry etching technologies for the etching and ashing of various materials. It combines the advantages of high etch accuracy, repeatability and high throughput for the most demanding applications. The system is a single chamber unit which can support a variety of substrates and can be used for a variety of etching processes including Asher and Dry Etch. It offers optimized corrosive gas delivery and a robust in-chamber RF generator for high throughput, repeatable etching/ashing processes. The plasma generated by the RF generator is used to produce high ion and energetic particles to etch and ash substrates of all types. The machine is controlled by a high-pressure controller and an advanced software tool which is used to monitor and control the process parameters. The asset also has a vacuum controller and pressure monitor to ensure accurate and repeatable etching and ashing. Finally, the model also features a range of safety features which include a door interlock, a gas leakage detector and a gas alarm equipment. These safety features ensure the safety of the users by preventing the accidental release of hazardous fumes and gases. Overall, UNAXIS 790 is a versatile, reliable etching/ashing system which can be used for a variety of advanced packaging applications. It offers high throughput and repeatability for the most demanding production applications.
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