Used PLASMATHERM / UNAXIS CONCEPT 1 #9283558 for sale

PLASMATHERM / UNAXIS CONCEPT 1 is an advanced etcher/asher equipment for precise nanoscale pattern formation. It combines a high-pressure, high-temperature inductively coupled plasma source with a unique modular sample transfer mechanism to achieve improved performance and throughput. The system is capable of highly accurate, repeatable etching and ashing of wide range of material, with features from the nanoscale to the micrometer scale. The unit includes a precision-controlled inductively coupled plasma source operating at atmospheric pressure and in-situ cleaning of the chuck surface to minimize wafer-to-wafer variation. The process gas can be precisely tuned using three-zone gas distribution, with the availability of both flow control and chemical reaction control to manage etch/ash processes. The sample transfer mechanism is designed to minimize sample-to-sample variation, as well as providing motion flexibility and control, facilitating rapid tool setup. Wafer orientation and recipe storage allow for highly optimized run times for complex etch and ashing processes. UNAXIS CONCEPT 1 also provides autonomous, highly-controlled wafer-level environmental control, minimizing tool and wafer effects on process quality and reproducibility. The machine is equipped with a range of ion getter and pressure controls, as well as injectable gas lines for chamber cleaning and repeatable gas delivery optimization. The tool offers user-friendly software and hardware tools to control and command the asset. Additionally, the model is equipped with a patented sample-only gas delivery equipment, enabling optimized etching and ashing conditions down to a few nanometers. An integral part of PLASMATHERM CONCEPT 1 is the newly developed etching monitoring system, providing real time control of the process. This unit includes a sequential sensor stack, including two temperature sensors and a pressure sensor, to enable optimal process control. The machine also includes a non-contact sensor to monitor etching profiles. The advanced technology of CONCEPT 1 makes it suitable for a wide range of nanoscale device fabrication processes. Its unique combination of hardware/software tools and repeatable performance enable the production of ultra-small features with significantly reduced variation. This makes it an ideal choice for semiconductor production applications.