Used PLASMATHERM / UNAXIS SLR 720 #9229827 for sale

PLASMATHERM / UNAXIS SLR 720 is an etcher / asher unit designed for precision plasma etching and ashing applications. It is optimized for 2D or 3D etching and ashing of substrates including silicon, quartz, semiconductor, sapphire, and other materials. UNAXIS SLR 720 utilizes UNAXIS in-line plasma etching technology (IPE) to provide accurate and repeatable process results with high throughput. The unit features a CVD chamber with a capacity of up to 720 wafers. It has a direct-driven load lock and with high repeatability, and the pressure regulation intelligent system dynamically adjusts the pressure while preserving the particle free environment. The etch chamber has an adjustable process pressure, and is equipped with PLASMATHERM MHD precision plasma source. This delivers very high etch rates while maintaining excellent selectivity with a wide range of etch gases including SF6, CF4, CF2Cl2, and many others. The unit is equipped with electronic mass flow controllers for precise dosing of etch and ashing gases, as well as the ability to control the temperature of the substrate during etching and ashing process. Additionally, the system supports high-precision plume imaging technology to actively monitor the etching process and adjust the etch recipe for greater stability and precision. It also features high-live fast tuning functions to optimize process parameters quickly. In terms of safety, the unit comes equipped with multiple process pressure control functions and numerous pressure safety sensors. This ensures a safe environment for personnel and sensitive samples while reducing the risk of process failure. Furthermore, the unit has an effective CO2 cooling system to ensure a stable process environment. Overall, PLASMATHERM SLR 720 is a versatile etcher / asher unit designed for precision plasma etching and ashing applications. It features numerous safety features and advanced process controls allowing for repeatable and reliable process results.