Used PLASMATHERM / UNAXIS SLR Series #293777485 for sale

PLASMATHERM / UNAXIS SLR Series is a cutting-edge line of plasma etcher/asher systems designed to meet the demanding etching and cleaning requirements of the semiconductor and thin film industries. As a leading solution in the realm of plasma processing equipment, this series offers unparalleled performance, precision, and repeatability for a wide range of applications, from advanced microelectronics to optoelectronics and more. At the core of UNAXIS SLR Series is its sophisticated plasma processing technology, which enables precise control over the etching and cleaning processes. The equipment utilizes a high-density plasma source, typically a radio-frequency (RF) or microwave source, to generate a plasma that reacts with the surface of the material being processed. This plasma can be configured to deliver a variety of chemistries, enabling selective etching or ashing of different materials with high selectivity and uniformity. One of the key highlights of PLASMATHERM SLR Series is its versatility in accommodating various substrate sizes and types. The system can support substrates ranging from small samples to large semiconductor wafers, making it suitable for both R&D and production environments. Additionally, the unit offers a range of processing modes, including batch processing for high-throughput applications and single-wafer processing for precise control over individual samples. In terms of process capabilities, SLR Series excels in both etching and ashing applications. Etching involves selectively removing material from the substrate surface, creating precise features and patterns required for device fabrication. The machine's advanced process control capabilities ensure high etch rates, excellent uniformity, and superior selectivity, making it ideal for fabricating advanced semiconductor devices with sub-micron feature sizes. Ashing, on the other hand, involves removing photoresist or other organic contaminants from the substrate surface. PLASMATHERM / UNAXIS SLR Series offers highly efficient ashing processes with minimal damage to the underlying material, ensuring high yields and reliability in device manufacturing. The tool's plasma chemistry control allows for gentle yet effective removal of organic layers, enhancing the overall cleanliness and quality of the processed substrates. Moreover, UNAXIS SLR Series is equipped with advanced automation and process monitoring features to enhance productivity and reliability. The asset includes sophisticated gas flow control, temperature regulation, and endpoint detection capabilities to ensure precise process control and repeatability. Additionally, real-time process monitoring and data logging enable users to track process parameters and optimize process recipes for consistent results. In conclusion, PLASMATHERM SLR Series stands out as a state-of-the-art plasma etcher/asher model that offers unmatched performance, flexibility, and reliability for a wide range of semiconductor and thin film processing applications. With its advanced plasma processing technology, versatile substrate handling capabilities, and comprehensive process control features, this series is a top choice for organizations seeking superior etching and ashing solutions for their most demanding applications.