Used PLASMATHERM / UNAXIS SLR Series #293807239 for sale

PLASMATHERM / UNAXIS SLR Series is a suite of advanced etcher/asher systems specifically designed to meet the demanding requirements of semiconductor manufacturing and research applications. These high-performance systems feature cutting-edge technologies and innovative design elements to provide superior process control, high repeatability, and exceptional etching/ashing uniformity across a wide range of substrates and processes. UNAXIS SLR Series comprises a range of models, each tailored to meet specific process needs and accommodate different wafer sizes and production volumes. These systems are equipped with state-of-the-art plasma sources, advanced gas delivery systems, precise temperature control, and flexible process capabilities to enable a wide variety of dry etching and plasma ashing applications. At the core of PLASMATHERM SLR Series is a highly versatile vacuum chamber designed to provide uniform plasma distribution and efficient gas-surface interactions. The chamber is constructed from high-quality materials to ensure excellent process stability, low particle generation, and long-term reliability. It is equipped with advanced pumping systems to achieve rapid pump down and maintain constant vacuum levels throughout the process. The plasma sources utilized in SLR Series are based on advanced radiofrequency (RF) and microwave technologies, offering precise control over plasma parameters such as density, uniformity, and ion energy. These sources can generate a wide range of plasma chemistries, enabling the etching/ashing of various materials, including silicon, silicon dioxide, metals, polymers, and more. The systems also feature advanced impedance matching networks to maximize plasma power transfer efficiency and ensure reliable plasma generation. The gas delivery system in PLASMATHERM / UNAXIS SLR Series is designed for precise control of process gases and flow rates to achieve the desired etch/ash rates and selectivity. The systems support both standard gas chemistries commonly used in semiconductor processing, such as oxygen, argon, sulfur hexafluoride, and chlorine, as well as custom gas mixtures tailored to specific applications. The gas delivery system is equipped with mass flow controllers, pressure regulators, and flow monitoring devices to ensure accurate and repeatable process conditions. Temperature control is a critical aspect of etching/ashing processes, and UNAXIS SLR Series incorporates advanced temperature control systems to achieve tight temperature uniformity across the wafer surface. The systems feature integrated temperature monitoring sensors, heating elements, and cooling mechanisms to maintain the wafer at the desired temperature throughout the process. This precise temperature control helps to minimize process variations and ensure consistent etch/ash results from wafer to wafer. PLASMATHERM SLR Series also offers a range of advanced process control features, including real-time plasma diagnostics, endpoint detection algorithms, recipe management software, and advanced data logging capabilities. These features enable users to optimize process parameters, monitor process performance in real-time, and achieve high process repeatability and yield. The systems are also equipped with user-friendly interface panels and intuitive software to facilitate easy operation and maintenance. Overall, SLR Series represents a state-of-the-art solution for advanced etching and plasma ashing applications in the semiconductor industry. With its cutting-edge technologies, flexible process capabilities, and superior performance, these systems are well-suited for a wide range of research and production environments where precision, reliability, and process control are paramount.