Used PLASMATHERM / UNAXIS SLR #9275973 for sale

ID: 9275973
Wafer Size: 6"
ICP Reactive Ion Etcher (RIE), 6" Load lock included.
PLASMATHERM / UNAXIS SLR is a high-speed plasma etching and ashing solution designed for the precise micromachining of hard materials. It has a range of features that make it ideal for use in the production of advanced tech applications, such as semiconductor and MEMS (micro-electromechanical systems). UNAXIS SLR is designed for advanced process flexibility and high productivity with the ability to process substrates up to 300mm x 600mm. It is suitable for ashing and etching of a wide variety of materials, including metals, ceramics, and polymers with etch rates up to 60 μm/min. The plasma etching and ashing equipment is built on a three-arm robot platform to enable precise processing of substrates. Its twin-pressure technology provides uniform etch rates across the entire substrate with the highest precision. It also offers one of the fastest, most robust etch/ash systems available for fast turnaround in the industry. PLASMATHERM SLR makes use of advanced plasma control systems to provide high-quality micromachined structures. A three-stage plasma extraction system ensures high substrate yields and low operating costs. The tunable plasma source also ensures optimum etch rate and uniformity independent of substrate material properties. The unit also offers a wide range of plasma gas options, including chlorine, oxygen, nitrogen, and argon, to enable applications for different materials. It also features sophisticated process automation for both high-volume and low-volume operations, ensuring high substrate yields with minimal operator intervention. SLR is also highly reliable, offering not only high performance but also years of problem-free operation. An integrated footswitch enables secure remote control of the machine. With its compact design and easy installation, PLASMATHERM / UNAXIS SLR is an excellent choice for applications requiring fast throughput, superior precision, and high product yields.
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