Used PLASMATHERM / UNAXIS Versalock #293804241 for sale

ID: 293804241
PECVD System Substrate size: 300mm x 300mm.
PLASMATHERM / UNAXIS Versalock is an etcher, asher and plasma cleaner designed for semiconductor, MEMS, and thin-film processing. This tool is built with a proprietary open-cathode plasma chamber and multiple process flows, making it one of the most versatile and effective tools for etching and ashing of delicate structures. The equipment features a new patented "Dry Etch Lock-Down" system for superior accuracy of plasma etching and ashing processes. The high-temperature UNAXIS Versalock etch unit is configurable to handle any substrate size up to 200mm and up to 12 etch/ash stages in configurations. The unique open-cathode design is optimized to offer precision control of ion-density, plasma parameters and process parameters. The machine offers an integrated high temperature thermal process chamber, configured for all types of plasma chemistry and gas mixtures. PLASMATHERM Versalock offers ultra-sharp edge definition, minimum profile fatigue and low-level etch selectivity. The tool features a patented dual-stage high-temperature ashing process that ensures thorough removal of deposited material down to the substrate level. Versalock asset also offers integrated vision monitoring and wafer mapping for precise characterization of process results and advanced process modification. An advanced recipe manager is included to provide uniformity of results and minimize time spent in experimentation. The sophisticated measurements and analysis capabilities of PLASMATHERM / UNAXIS Versalock are further enhanced with real-time data logging and parameter optimization. An optional high-resolution spectrometer provides spectral analysis of process results, ensuring accurate characterization of product performance. An automated test model is included to ensure product consistency, product accuracy, and traceability to process. UNAXIS Versalock etcher, asher, and plasma cleaner are ideal for microstructures, MEMS, and microscopic molecular etching / ashing processes. The unique open-cathode design eliminates cross-contamination, enhances edge definition, and improves etching uniformity. The short scan time and powerful test equipment tools make it a versatile and effective etch and ash tool. With its revolutionary Dry Etch Lock-Down system, PLASMATHERM Versalock truly stands out among its competitors.
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