Used PLASMATHERM / UNAXIS VLR 700 #9384115 for sale

ID: 9384115
Vintage: 2001
PECVD System 2001 vintage.
PLASMATHERM / UNAXIS VLR 700 is a state-of-the-art etcher/asher suitable for advanced semiconductor fabrication applications. This equipment is a hybrid plasma/vacuum etcher/asher capable of working with both etching and ashing processes for various types of material surfaces. It is a modular system composed of three interconnected main components that allows for the best accuracy and flexibility when processing substrates. The RF Generator is one of the main components of UNAXIS VLR 700 and supports both etching and ashing processes. It is capable of reaching power levels up to 1000 Watts with a frequency range between 20 kHz and 13.56 MHz and supports high-density plasma uniformity, repeatability, and excellent process control. This facilitates precise processing, results in improved yields and lower cost of ownership. The Process Chamber of PLASMATHERM VLR 700 is the centerpiece of the unit and is designed to provide a low pressure, uniform plasma environment. Its small footprint allows for easy installation and maintenance, while its removable, reflowable features and versatile access ports facilitate efficient substrate loading, unloading, and maintenance. The process chamber is equipped with an efficient health monitoring machine and is suitable for processes like etching, cleaning, and building thin films and nanostructures for advanced semiconductor fabrication. Finally, the Controller is the control hub of VLR 700, enabling users to efficiently monitor, maintain, and control the etching/ashing processes. It allows for the manipulation of more than 150 different parameters and is easily integrated with external systems by using industry standard interfaces. The controller includes advanced diagnostic capabilities, making it suitable for a variety of process conditions and process recipes. PLASMATHERM / UNAXIS VLR 700 provides a comprehensive, integrated etcher/asher tool that is ideal for semiconductor fabrication applications such as MEMS, thin film etching, nanofabrication, and advanced packaging. Its combination of both etching and ashing capabilities, top of the line features, and excellent process control enable manufacturers to produce high quality and reliable components efficiently, with superior yields and greater returns on their investments.
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