Used PLASMATHERM / UNAXIS VLR #9139629 for sale

PLASMATHERM / UNAXIS VLR
ID: 9139629
Wafer Size: 6"
Vintage: 2002
ICP LM-TM system, 6" 2002 vintage.
PLASMATHERM / UNAXIS VLR is a type of etcher/asher typically used for semiconductor processing and other applications. It is capable of processing hundreds of wafers per hour utilizing its high-temperature plasma jets and other integrated components. The entire equipment is designed to be user-friendly yet efficient, and its various safety features make it a suitable option for both professional settings as well as home labs. UNAXIS VLR contains a high precision planar waveguide which sends highly focused plasma jets across a liquid productivity chamber that is open to both the atmosphere and a vacuum system. The plasma jets are capable of reaching temperatures exceeding 1000°C and are used to remove material from the surface of the wafer. The liquid productivity chamber is a 300mm quartz vessel containing an independent recirculating liquid supply to control the temperature and corrosive environment within the chamber. The unit also contains an integrated cooling module and a computer interface, allowing users to program and monitor the etching process. The cooling module helps to rapidly cool the substrate after the etching process has been completed, allowing for a quick and efficient production cycle. The computer interface allows for not only the programming of the machine, but also for real-time monitoring and data logging. As such, users can monitor both process conditions and the results in an effort to maintain the highest levels of precision. Lastly, PLASMATHERM VLR also features a wide array of safety features to ensure minimal risk of damages to the wafers or users. This includes a closed tool which prevents personnel from coming into contact with the corrosive chemicals used in the etching process, as well as several integrated sensors which ensures the asset is functioning safely and efficiently. Overall, VLR is an efficient and reliable etcher/asher, capable of handling hundreds of wafers per hour with precision. Thanks to its high-temperature plasma jets, cooling module, integrated safety features, and computer interface, it is suitable for both professional and home settings, providing users with an effective and efficient model that can be used to produce wafers of high precision.
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