Used PLASMATHERM / UNAXIS VLR #9205770 for sale

PLASMATHERM / UNAXIS VLR is a unique dry-etching and ashing tool designed for processing large substrates. The equipment is designed to process substrates up to 300mm in diameter, and with a maximum etch rate of 10 microns/minute it can meet the highest demand of high-volume production. In addition to its high-volume production capabilities, UNAXIS VLR also offers superior surface features, high productivity, and low running costs. The system is capable of processing a wide variety of substrate materials including oxide-based, dielectric, organic, and polymeric materials. The versatile chamber configuration also allows for a range of controlled etch processes such as plasma polymersization, plasma etch, dry etch, surface activation, and metal etch. The unit also offers the possibility of sequential etch processes for different types of substrates, enabling the production of devices with complex structures and 3D geometries. The machine's unique set of features have been designed to meet the highest standards of quality and performance. Its Dual-Vacuum Chamber offers efficient process time and consistent high-throughput performance. The advanced Process Control Monitoring Tool (PCMon) helps ensure highly repeatable precision processes, while the optional CAD Compatibility allows for quick tool-changing for maximum throughput. Additionally, the asset is compatible with a wide range of certification and safety standards including CE Mark, EU-EMC Directive, and UL/CSA. PLASMATHERM VLR comes with a robust on-board user interface and multiple digital I/O ports for connection to networked systems. The integrated diagnostics model and operating software provide automated setup and operation, while the real-time trending and data logging offer complete control of process parameters and status. Furthermore, the equipment is furnished with safety interlocks, shielding gas, and an oxidation retardant for an environmentally friendly solution. Overall, VLR is a highly advanced etcher/asher ideal for high-volume production. It offers a unique combination of high-performance features, intuitive user interface, and an environmentally friendly solution. With a wide range of substrates and processes, the system is perfect for users that require precision control and repeatability of their etching and ashing operations.