Used PLASMATHERM Versaline #293592006 for sale

PLASMATHERM Versaline
ID: 293592006
Wafer Size: 6"
ICP-RIE System, 6" PSS ICP: 4" x 4".
PLASMATHERM Versaline etcher/asher is a state-of-the-art etching and ashing equipment designed for superior performance in semiconductor fabrication applications. This system features a wide range of etching and ashing solutions for a variety of substrates and processes. Versaline features a highly flexible process chamber and a wide range of configurations. This chamber has independent gas intake and exhaust to provide precise control over the process environment. The layout of the chamber has two-zone availability with an isotropic ashing zone and a directional etching zone. This allows the unit to be scaled in order to accommodate different process requirements. PLASMATHERM Versaline utilizes an advanced magnetron sputtering source that provides precise flux control and high uniformity. It also has a highly efficient vacuum environment, with a pulse machine in place to maintain clean conditions and reduce the amount of contaminates that could affect the process. The inert atmosphere inside the chamber ensures the highest quality results. In addition, Versaline has a built-in load-lock tool, allowing users precise control over the etch atmosphere. This asset also features a computer-controlled gas purge module, allowing precise gas control. PLASMATHERM Versaline also features precise temperature control, allowing users to select the optimum process temperatures for their specific substrates and processes. Versaline is designed for precise and reliable operation, with a low maintenance requirement and excellent performance. Additionally, the model has advanced monitoring and diagnostic capabilities, giving users the information they need to effectively optimize their process. Overall, PLASMATHERM Versaline etcher/asher is an advanced, highly efficient, and easy to use equipment provides precise etching and ashing solutions. It is an ideal system for any semiconductor fabrication application, allowing users to achieve the highest quality results. It is designed for reliability and performance, with a low maintenance requirement and excellent process results.
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