Used PLASMATHERM VLR 700 #293759446 for sale

Manufacturer
PLASMATHERM
Model
VLR 700
ID: 293759446
Wafer Size: 6"
Vintage: 2006
Dry etcher 2006 vintage.
PLASMATHERM VLR 700 is a versatile etcher/asher tool designed for advanced plasma processing applications in the semiconductor industry. This state-of-the-art equipment incorporates innovative technologies to enable precise etching and cleaning processes on a variety of substrates, making it an ideal solution for research and development as well as high-volume production environments. At the core of VLR 700 is a high-performance plasma source that generates a highly controlled and uniform plasma density for efficient processing. The system is equipped with multiple gas injection ports, allowing for precise control over the gas flow rates and compositions to tailor the etching or ashing chemistry to specific requirements. Additionally, the unit features advanced RF power supplies for generating and controlling the plasma, ensuring consistent and reliable processing conditions. One key feature of PLASMATHERM VLR 700 is its high-precision substrate handling machine, which enables accurate positioning and alignment of samples during processing. This ensures uniform etching profiles and eliminates any potential for sample damage or misalignment. The tool also includes a sophisticated temperature control mechanism to maintain the substrate at the desired temperature throughout the process, further enhancing process reproducibility and control. VLR 700 offers a wide range of process capabilities, including etching of various materials such as silicon, silicon dioxide, silicon nitride, metals, and more. It also supports ashing processes for removing photoresist and other organic contaminants from substrates. The asset provides configurable process recipes that allow users to optimize parameters such as process time, gas flow rates, temperature, and power settings to achieve the desired results. In terms of user interface and control, PLASMATHERM VLR 700 features a user-friendly software platform that allows for easy programming and monitoring of the processing parameters. The model offers real-time process monitoring and data logging capabilities, enabling users to track process performance and make adjustments as needed. Additionally, the equipment can be integrated with a host computer for remote monitoring and control, enhancing overall efficiency and productivity. VLR 700 is built with a focus on reliability and robustness to ensure long-term performance and minimal downtime. The system is constructed using high-quality materials and components, and it undergoes rigorous testing and quality assurance procedures to guarantee consistent and reliable operation. Furthermore, the unit is designed for easy maintenance and servicing, with accessible components and user-replaceable parts to minimize interruptions to production schedules. Overall, PLASMATHERM VLR 700 represents a cutting-edge solution for etching and ashing applications in the semiconductor industry. Its advanced technology, precise control capabilities, and user-friendly interface make it a valuable tool for a wide range of research, development, and production processes. With its superior performance and reliability, VLR 700 is a key asset for semiconductor companies looking to achieve high-quality results and maximize productivity in their plasma processing operations.
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