Used PLASMATHERM VLR #9156981 for sale
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ID: 9156981
Wafer Size: 8"
Vintage: 1998
ICP Bosch system, 8"
Cassette to Cassette System
(1) LM/TM module single load lock with single end effector
(1) ICP Bosch module
ESC chucks
ENI 600W RF power supply
Advanced Energy RFPP 10M RF power supply
Leybold 1000C turbo pump
NT20 controller
VAT PM5 Throttle valve controller
Leybold turbo pump with controller
Heated chamber walls with 6 zone controller
(4) MFCs
Windows OS with Plasmatherm Versaworks software
Keyboard and mouse
208V,60A, 60Hz
1998 vintage.
PLASMATHERM VLR is an advanced etching and ashing equipment designed to enable high precision patterning and processing of a variety of substrates. It uses a combination of high-energy electron cyclotron resonance plasma sources and rapid thermal annealing to achieve impressive process precision and performance. VLR is a fully automated etching and ashing system, capable of processing substrates ranging from 1 to 9 inches in size. The unit also features a range of etch gas and gas injection techniques to ensure optimal etching results. The etch process is controlled by an integrated computer machine, allowing for a wide range of etching parameters to be set and monitored. After the etching process is complete, the substrate is rapidly heated to remove residual photoresist, leaving a clean surface ready for further processing. PLASMATHERM VLR uses a three-source parallel ECR plasma source to achieve precise etching conditions. The tight control of the ECR plasma allows for high precision etching of deep structures with minimal radius of curvature. Additionally, the ability to tailor the etching parameters to the specific process and substrate means that the user can achieve optimal etching results. VLR also features a number of other process capabilities such as etch selectivity control, substrate bias, deep anneal, and plasma pre-treatments. This allows the user to tailor the etching and ashing process to their specific needs. PLASMATHERM VLR also offers an integrated cooling tool to reduce device damage caused by high etch rates, ensuring optimal results for all applications. In summary, VLR is an advanced etching and ashing asset designed for high precision patterning and processing of a variety of substrates. The model uses a combination of ECR plasma sources and advanced thermal annealing techniques for impressive process precision and performance. In addition, the equipment offers a range of etch gas and gas injection techniques for superior process control. The integrated cooling system ensures that devices are not damaged by high etch rates. With its comprehensive range of features, PLASMATHERM VLR is the perfect tool for high-quality etching and ashing.
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