Used PLASMATHERM VLR #9156983 for sale

PLASMATHERM VLR is an etcher and asher equipment designed for high-throughput, precision etching and cleaning applications. The system employs an innovative PlasmaPlusTM technology for an advanced fabrication process. This process combines the corona discharge plasma processes of Remote Plasma, Ion Beam, and O2-glycol process with an oxygen plasma process to offer the highest etching resolution and clean process results. VLR unit is ideal for production applications on a variety of surfaces and substrates, including glass, metals, and ceramics. The machine features an easy-to-use user interface that allows for advanced process control. The On-Screen Wall Menu allows for access to multiple parameters and functions, and a user-friendly, Touchsensitive LCD touchscreen allows for the simple execution of operation commands. The tool features a powerful automated recipe editor, allowing users to tone down parameters for experienced operators or turn up the settings for results. The asset is made up of two interconnecting chambers, which form its combined etching/cleaning chamber. The first chamber is the etching chamber which consists of two "plates", a bottom plate and a top plate. The bottom plate is connected to a distributed line of gas inlet sources and is responsible for delivering the reactive gas species to the substrate surface. The top plate is equipped with electrodes which generate the plasma at the substrate surface. The second chamber is the cleaning chamber, which is equipped with fixtures and nozzles for delivering a variety of different cleaning solutions. PLASMATHERM VLR model employs an advanced, energy-efficient High-Density Plasma (HDP) source to ensure that the reactive species are efficiently delivered to the substrate and that clean and reproducible process results are obtained. Other advanced features include gas switching, automated recipe editor, fast process time, and low cost-of-ownership. Overall, VLR etcher and asher equipment provides a powerful solution for advanced etching and cleaning applications in the high-throughput production environment. The system's advanced plasma concepts and energy-efficient HDP source technology provide superior process results with fast process time and low cost-of-ownership. The unit's user-friendly interface, intuitive operation and automated recipe editor also ensures that the highest etching resolution and clean process results can be achieved quickly and easily.