Used PLASMATHERM VLR #9205768 for sale

PLASMATHERM VLR
Manufacturer
PLASMATHERM
Model
VLR
ID: 9205768
Wafer Size: 6"-8"
Vintage: 1996
Reactive Ion Etcher (RIE), 6"-8" Wafer processing LM / TM System 1996 vintage.
PLASMATHERM VLR is a highly efficient etcher/asher equipment designed for semiconductor and wafer level manufacturing. It is equipped with a direct-drive plasma generator that can produce up to 3,000 watts of power, with the ability to reach temperatures of up to 197 degrees Celsius. VLR System is designed to deliver sub-micron etching with precision and accuracy, providing an exceptionally clean edge profile with extremely high uniformity and yield. PLASMATHERM VLR Unit has an advanced batch processing controller, as well as an environmental control unit (ECU), allowing for precise temperature and cleaning regulation. VLR Machine also offers a variety of process options such as ultra-low voltage etching and 1000 Hz thermal blasting for maximum control of the process. PLASMATHERM VLR Tool can be used with several types of materials, including Copper, Aluminum, and Triton 20 material, allowing the user to choose from a variety of sizes for the small parts being processed. In addition, it supports automated mask shifting, which allows for fast and precise mask shifting when needed. The asset also offers a unique vapor-phase etching model, which allows for plasma processing of polymer and oxide layers, as well as T-fuse reactions. VLR Equipment also has an extensive safety system, which includes a flame trap, fire detection, and fire alarms. All safety measures ensure that the user is safe while using the unit. PLASMATHERM VLR Machine has an intuitive graphical user interface that allows for easily modifying process parameters, setting up batches, running recipes, and monitoring the etching process. For added convenience, the tool can be connected to a network, allowing it to communicate with other systems. VLR Asset also has a Liquid Crystal Display (LCD) that allows for easy monitoring of the process during etching. In conclusion, PLASMATHERM VLR model is a highly efficient and high-precision etcher/asher equipment for semiconductor and wafer level manufacturing. It is equipped with a direct-drive plasma generator, an advanced batch processing controller, and an environmental control unit, allowing for precise temperature and cleaning regulation. It also offers a variety of process options, including ultra-low voltage etching and 1000 Hz thermal blasting. In addition, the system is equipped with safety features such as a flame trap, fire detection, and fire alarms. The intuitive graphical user interface and LCD display make it easy to monitor the process during etching.
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