Used PLASMATHERM Wafer/Batch 740 #293595644 for sale

PLASMATHERM Wafer/Batch 740
ID: 293595644
Dual plasma and Reactive Ion Etcher (RIE), 4".
PLASMATHERM Wafer/Batch 740 is an advanced etcher/asher equipment designed to meet the diverse needs of the semiconductor and other industries requiring high precision process control. It is an all-in-one etcher/asher system that enables the user to achieve extremely high accuracy for the etching and ashing of substrates. This unit employs multiple independent controllers that precisely monitor and control etching and ashing processes for precision etching capability and process repeatability. The machine includes independent recipe-based control for each etcher/washer chamber and automatic, repeatable process control as multiple chambers run in parallel. With integrated, interactive software modules, the user can customize the etcher/asher tool to meet their exact process requirements. The asset features advanced diagnostics with event logging and process data storage, and powerful, secure access control. The model utilizes advanced microwave-enhanced inductively-coupled plasma technology, providing the highest quality etching and ashing processes, resulting in the least possible contamination of the substrate. With multiple plasma sources, the equipment can etch and asher in one unified process. This system is well suited for advanced manufacturing applications such as MEMS, microfluidics, and advanced packaging. PLASMATHERM Wafer/Batch 740 utilises a process monitoring and analysis suite, which allows the user to precisely monitor process parameters while the wafer is being processed. The unit has powerful automatic calibration and cleaning features. The integrated safety and event control machine provides compliance with the most stringent safety and process standards. Furthermore, the tool features an integrated die alignment and SCARA robot research and development asset. This model is capable of producing repeatable results and highly accurate device. It provides fast, consistent deposition and etch processes, as well as supporting a range of advanced fluxing and metallization processes. PLASMATHERM Wafer/Batch 740 meets the requirements of the most demanding etching and ashing applications. With its extremely flexible design and integrated modules, it enables the user to create highly efficient and cost effective wafer processing solutions that meet their exact specifications and process requirements. This equipment is an ideal solution for semiconductor and advanced manufacturing applications.
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