Used POLARON PT7160 #293636654 for sale

POLARON PT7160 is a state-of-the-art reactive ion etcher/asher designed for precision etching and ashing of both dielectric and conductive materials. It is a robust, high-performance etcher/asher with a wide range of process capabilities. The equipment includes a 300 MHz RF generator and a process control module that allows for precise adjustment of both chamber pressure and etching/ashing rates. It has a quartz chamber and an automated mirror sampling technique for precise control of etching or ashing profiles. PT7160 is capable of processing both standard and non-standard substrates, such as oxidized silicon wafers, compound semiconductors (III-V, II-VI, and IV-VI), phosphide compounds (GaAs, AlGaAs, InGaAs, and InP), superconducting materials, and III-nitrides. The chamber is designed to work with a wide range of gases, including mixtures of O2, CHF3, SF6, and H2. The system further features a chamber pressure range of 1 to 10 mTorr, which allows for good selectivity, low etching rates, and precise etch/ash profiles. The etching and ashing rates can also be precisely adjusted with a temperature chamber range of 10-900°C. POLARON PT7160 has excellent process repeatability, with etching and ashing rates held to within ± 5%. Furthermore, the unit offers versatile process capabilities such as multi-layer etching, patterning, surface cleaning, etch-back, trenching, and profiling. The machine is also equipped with a programmable mixture of process gasses to provide virtually unlimited process capability. With its precise control, advanced features, and robust design, PT7160 is an ideal etcher/asher for those looking for precise control over the etch/ash profile.