Used PSC DES-212-304AVL #9097138 for sale

PSC DES-212-304AVL is an Etcher / Asher. It is a subtractive etching system utilizing reactive ion etching and chemical etching processes. It is specifically designed to etch wafer sizes from 2" to 8" with a maximum of 4 chambers. This etcher is capable of producing virtually any shape, layer pattern, or profile on semiconductor substrates including printed circuit boards, LEDs, and high frequency/microwave devices. PSC DES-212-304-AVL etcher is equipped with a variety of functions, including RF and DC bias, chemical and reactive ion etching, and laser processing. Each chamber is independently controlled for both chambers and is equipped with power supplies, RF matching networks, and DC and RF switches. Additionally, each chamber is equipped with a High Vacuum quartz crystal monitor for precise chamber environment control. It also features a variable pressure QCM controller with real time plotting of QCM frequency shifts, allowing for precise real time etch control. Additionally, DES-212-304AVL features a programmable, microprocessor-controlled gas box for up to 10 gases. The etcher is capable of supporting a wide variety of etch chemistries, including chlorine, ammonium, nitrates, organic halides and higher chemical species. The advanced gas flex control system with vacuum pinch valves gives the etcher reliable, high performance etching for a variety of processes. DES-212-304-AVL is the ideal etcher for a wide variety of applications. It is capable of precisely and accurately etching small, intricate features with uniform depth control. It is especially capable of producing complex patterns, planarization, and deep profiles, as well as precise photolithographic reworks on semiconductor substrates. It is also highly repeatable and reliable, making it an excellent choice for production use.