Used PSC DES-212 #9028317 for sale

PSC DES-212 is an etching / asher equipment designed for physical processing, offering high productivity in the nanometer range. It is powered by a dual etching / asher cell that results in short cycle times and features advanced controls to increase process repeatability. It features a high powered, 14kW rf generator with careful impedance and pulse control. DES-212 is a versatile system capable of processing a variety of materials, from polymers to semiconductor wafers. The large process area allows for large batch processing and high throughput. The unit features dual-cell etching and ashing capability, providing both etching and cleaning capabilities in the same machine. The etching process uses a high-powered RF generator to produce an energy field that causes chemical reactions in the wafer material, which removes material layer by layer. The cleaning process uses an oxygen plasma to remove organic and metallic contaminants from the wafer surface. PSC DES-212 is a computer controlled tool equipped with a powerful process controller, as well as software designed for controlling operations such as endpoint detection, material trim and rework, asset monitoring, and data analysis. It supports a range of process parameters including temperature, pressure, gas flow, power, and plasma generation. The model is capable of highly precise and repeatable results due to the advanced controls and feedback loops in the equipment's programming. The system has a built-in recipe creator and library, allowing for customized recipes as well as pre-programmed process recipes for popular etching processes. DES-212 offers a variety of integrated safety features, including a closed-loop control unit, dual-level gas capabilities, and an additional off-gas scrubber. The machine is designed for safe, efficient operation with the ability to monitor multiple process parameters and logs data to be reviewed later. PSC DES-212 is a reliable, easy-to-use etching / asher tool that provides highly precise results that may be customized based on individual process needs. It is a cost-effective asset for any laboratory, providing an excellent platform for micro- and nano-scale etching and cleaning tasks.