Used PSK DES-212-304AVLIII #9018567 for sale

PSK DES-212-304AVLIII is a dual-head, semi-automatic selective etcher and asher manufactured by Plasma Systems Knox (PSK). It is designed for dedicated use in the etching and ashing of modern microelectronic materials. Built with innovative technology, PSK DES 212 304 AVL III is a compact and reliable etcher/asher with robust performance and high-efficiency output. It has a small footprint, making it ideal for areas with minimal space. The equipment utilizes a low-noise, low-energy, ceramic core inductive configuration that minimizes electrical power losses while producing maximum temperature and plasma stability. The double chamber design of DES-212-304AVLIII provides ample set-up time between multiple etching and ashing operations, which enhances system reliability. The unit is compatible with a variety of chemical etchants and reactants, allowing for the etching and ashing of thin films, silicon wafers, and crystalline oxide materials. The etching and ashing process is highly reliable and repeatable, minimizing the number of reworks necessary. Furthermore, DES 212 304 AVL III is capable of achieving exceptionally precise results, thanks to its accurate and easy-to-use temperature control. PSK DES-212-304AVLIII is designed for both manual and automatic operation. Manual operation is carried out via a user-friendly graphical interface, which displays all variables and settings for each stage of the etching or ashing process. Additionally, PSK DES 212 304 AVL III has a self-diagnostic function to ensure that any anomalies in the machine are detected quickly and efficiently. This tool includes numerous safety features to protect both users and equipment. The temperature is constantly monitored and controlled using an adjustable range, preventing any thermal runaway or excess temperatures. Furthermore, the etcher/asher is equipped with a high-temperature fume-removal asset, which prevents the risk of volatile chemicals entering the surrounding environment. DES-212-304AVLIII also includes emergency stop buttons to ensure that all operations are stopped immediately in the event of an unexpected incident. In conclusion, DES 212 304 AVL III is a reliable and highly efficient etcher/asher designed for the etching and ashing of microelectronic materials. Its advanced features, such as its low-noise, low-energy ceramic core inductive configuration, dual chamber design, and user-friendly graphical interface make it an ideal choice for areas with minimal space requirements. Additionally, its safety features ensure the protection of users and equipment.