Used PSK DES-212-304AVLIII #9269462 for sale

PSK DES-212-304AVLIII is a state-of-the-art etching and ashing equipment designed to process a wide range of substrates including metals, polymers and glass. The system is equipped with a PECVD reactor with a quartz tube to deposit coatings and a lift off unit to separate individual structures. PSK DES 212 304 AVL III features a heavy-duty, stainless steel process chamber with vertically-movable wafer carriers designed for temperature uniformity during the etching and ashing process. DES-212-304AVLIII offers an advanced range of process capabilities, backed by dedicated chamber control and monitoring systems. The etcher is equipped with a programmable Peltier temperature controller for monitoring and maintaining process temperatures. The machine is also equipped with a high-precision Mass Flow controller for accurate measurement of process gases. The etching and ashing process is also monitored and controlled using a high-performance, touch-panel display. DES 212 304 AVL III etcher is capable of processing substrates with dimensions up to 8" x 8" (203mm x 203mm). It is equipped with sophisticated etching and ashing technologies including reactive ion etching (RIE), inductively coupled plasma etching (ICP), chemical etching, and wet etching. The tool is designed to process substrates up to a maximum temperature of 600 degrees Celsius and a maximum pressure of 760 Torr. In addition, PSK DES-212-304AVLIII features a unique post-processing station for protective coating deposition and a built-in safety interlock asset. The etcher also includes a wide range of in-situ and ex-situ metrology and inspection capabilities. The model comes with robust data storage and retrieval options to facilitate further analysis and optimization of the etching and ashing process. PSK DES 212 304 AVL III etcher is designed to provide reliable processing performance with maximum efficiency and yield. The etcher is equipped with a user-friendly graphical interface and easily accessible point-and-click commands for quick and easy operation. The etcher is well suited for a wide range of research and development applications.