Used PSK Supra III #293639182 for sale

PSK Supra III is a sophisticated crystallographic etching instrument designed for superior sample preparation and analysis. Its advanced data-driven design allows for precise etching with unparalleled speed and accuracy. The multi-mode etching chamber can accommodate substrate sizes up to 8" x 8" and permits the use of multiple masks, allowing for greater flexibility and complex etching designs. The main chamber is equipped with a tilt capability for optimal etching and superior process quality, and it has a 1.3 bar etch pressure with an optional nitrogen flow of up to 1.3 LPM. The unique design of Supra III enables a wide range of processes, including UV etching, reactive ion etching (RIE), molecular beam etching, and plasma etching. PSK Supra III is uniquely suited to a wide range of etching needs, thanks to its advanced, customizable user interface. Advanced process control monitoring allows users to precisely adjust a range of parameters including temperature, etch pressure, and gas flow. The user-friendly design also makes it easy to develop new recipes, and store project files for easy retrieval and future use. The embedded safety systems and auto-stop facility ensure that no harm is done to the substrate material or to the machine itself. Supra III operates on a wide range of power supplies and can be quickly set up for use in any environment. It is equipped with an efficient cooling system that helps eliminate heat build-up, and the user-friendly design ensures easy operation for any level of user. The advanced software systems make customizable graphical reports, making data-driven analyses simple. The fail-safe design ensures that all process parameters are accurately maintained and makes it possible to monitor and control the precise parameters of each etch recipe. PSK Supra III's precise, efficient, and customizable design make it an ideal choice for precise sample preparation and analysis improvements that help improve time-to-result and allow for precise adjustments to the etching process. With its wide range of features and flexible user interfaces, this advanced etcher offers the perfect solution for laboratories and research facilities who need reliable and precise results.