Used PSK Supra III #293705871 for sale

PSK Supra III is a high speed, precision etcher/asher ideal for semiconductor processing applications. The unit features an extremely precise, high-powered plasma source that operates at a low temperature, making it ideal for a range of prototyping and production-scale operations. The high-end HF andDC power supplies provide the flexibility necessary to perfectly tailor the etching parameters to individual application needs. The unit also comes with a unique programmable control equipment which enables users to tailor the etching process according to specific processing conditions, allowing for repeatable, predictable results. Supplied with a variety of easy to use software packages, the system provides the capability to modify the plasma density, substrate bias voltage, gas control, and other important parameters. Supra III allows for a wide range of easy to understand graphical and data reporting of the etching process, giving the user instant visual feedback. PSK Supra III's advanced rotatable chamber has been designed to provide excellent uniformity of the processing of each wafer, as well as reduce the amount of dangerous gases present. It comes with a built-in vacuum unit to remove unwanted deposits and gases from the machine, ensuring that the process results are as consistent as possible. The tool also has an intuitive alarm asset to alert operators of any potential errors during use. The unit is engineered to meet tight specifications to ensure reliability, accuracy, and consistent results. The design of the model ensures that the highest component quality can be achieved, extending the lifespan and minimizing performance fluctuation. It also includes a smart self-diagnostic equipment for integrated support and safety. In addition, Supra III is an ergonomic, user friendly design that is easy to use and maintain. Supplied with a comprehensive range of tools and setup guides, users can have the system up and running in no time. This makes PSK Supra III a highly sought-after choice for a variety of semiconductor processing applications.