Used PSK TERA 21 #9270662 for sale

PSK TERA 21 is an etcher/asher designed to enable precision etching and ashing of semiconductor materials. It is a computer-controlled equipment offering a wide range of process capabilities, including selectivity, high accuracy, low-pressure etching, and in-depth plasma ashing. It is specifically designed to meet the needs of advanced semiconductor fabrication. The system is equipped with a 13.56MHz transmitter and 30MHz-400MHz receive antenna. This provides the necessary RF power to etch the material on the substrate. The antenna also functions as a receiver, providing an output signal that is used to monitor the etching reaction. The etching process is monitored and controlled via the PC/SC-based software, which can be used to adjust the etching parameters to achieve the desired results. The unit has an independent plasma source, enabling etch selectivity and process optimization. It is also equipped with an independent gas delivery machine, allowing for precise control of the etching media. The tool also has an integrated loadlock, allowing for bi-directional loading of the sample and reducing the overall cycle time. The asset has an automated process monitoring model, which can detect process drifts before they become serious. This helps ensure process consistency and reliability. The equipment's integrated loadlock allows for fast wafer transfers between process stages, and its manual control option allows greater flexibility for manual operation. The system is capable of performing etching processes at pressures as low as 1mTorr. This enables the unit to etch even the most delicate materials with minimal distortion, ensuring high-precision etching results. The machine also has an integrated process verification function, which helps ensure process repeatability and reliability. Overall, TERA 21 is an ideal etcher/asher for semiconductor fabrication, providing precision etching, ashing, and in-depth plasma processing. Its combination of advanced features, ease of use, and reliability make it an excellent option for precision etching and ashing of semilconductor materials.