Used PVA TEPLA / METROLINE 400 #9266257 for sale

PVA TEPLA / METROLINE 400 is an etcher/asher equipment designed for precise etching and ashing of substrates for semiconductor device fabrication. This system utilizes a patented, proven plasma generating technology to transfer electrical energy into a gaseous discharge, producing a uniform, homogenous plasma that creates ideal etch and ashing conditions. The unit features a motorized chuck for secure substrate transfer, automatic control of parameters for consistent etch profiles, high-efficiency exhaust filtration, and rigid construction for accurate etch uniformity. The machine is designed with a number of safety features including interlock protection, inert gas flowrate monitoring, and over-temperature protection. The etcher/asher has a large etch chamber that ensures uniform etching across the entire substrate plane. An integrated vacuum blower maintains a constant atmosphere inside the chamber. A fast-acting, precise mass flow controller regulates the ratio of the gases used for etch and ashing. A horizontal elliptical antenna generates a low-frequency RF plasma, producing a uniform etch profile with low levels of RF energy surface interaction. The tool is also compatible with a wide variety of gases including O2, CF4, CHF3, HBr, NH4F, and NF3. It also has a temperature control asset capable of reaching maximum temperatures up to 240°C and includes a precision thermocouple and heater for accurate temperature control. PVA TEPLA 400 also has an integrated substrate cooling mechanism that ensures a rapid cool-down of etch and ashing parts after etching and ashing. In addition to the model's etching capabilities, the equipment also includes a software package that allows the user to monitor and control all system parameters, and a standard connection to PVA's proprietary Dataway process management unit. These features allow for full logging and control of etch and ashing processes, giving the user complete control over their process. This machine is suitable for use in fabrication environments that require precise, high-yield etching and ashing.