Used PVA TEPLA Sam 400 Twin #9354501 for sale

ID: 9354501
Wafer Size: 4"
Scanning Acoustic Microscope (SAM), 4" (2) OLYMPUS Transducers (2) PC Systems Operating system: Windows XP Equipped with: Pegasus motion controller PVA Hilbert filter RP H1 Remote pulser Pulser and receiver unit.
PVA TEPLA Sam 400 Twin is a high-performance etcher/asher designed for superior etching/ashing of various types of substrates. It is one of the most advanced etching/ashing systems on the market and is capable of achieving highly accurate results with short etching/ashing times. The unit features dual etch/ash processing chambers which are heated and controlled separately for optimal etching/ashing performance. The dual chambers can be programmed with different parameters to carry out etch/ash processes with different substances. The equipment offers multiple etch/ash cycle types and step sequences that are adjustable to match the substrate type. Sam 400 Twin offers a number of advanced capabilities. It features an advanced material and process control system to monitor the reaction process, and an easy to operate digital controller which enables a user to adjust various parameters. It can support a large range of air pressures and temperatures and has an integrated filtration unit for removing impurities from the etching/ashing gas mixtures. PVA TEPLA Sam 400 Twin is capable of operating in both a single and double-sided mode. In the single-sided mode, a single wafer is loaded and moved to the process chamber for etching/ashing. In the double-sided mode, two wafers are loaded onto opposite sides of the platen, which is then lowered into the process chamber for etching/ashing on both sides. The unit's design allows for easy maintenance and replacement of parts for extended lifetime performance. It features a full range of accessories and tools for machine maintenance, such as filter brushes and sample holders for optimized removal of sample materials. Overall, Sam 400 Twin is an advanced etcher/asher designed to deliver superior etching/ashing results with short etching/ashing times. It features a combination of powerful capabilities, advanced material and process control, and easy maintenance, making it an ideal all-in-one solution for a variety of etching/ashing applications.
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