Used PVA TEPLA / TECHNICS Gigabatch 300M #293752384 for sale

PVA TEPLA / TECHNICS Gigabatch 300M is an etching/ashing equipment designed specifically for electronics manufacturing and semiconductor fabrication processes. It is a robust and reliable system that produces high-precision semiconductor products with precise and repeatable etchings. The unit is engineered for a maximum of 300 wafers per batch and can complete an entire etching/ashing process for a series of up to 20 steps in a single run. Each batch takes from one to two hours, and the entire process can be completed in a matter of days. The chamber chamber temperature is controlled with an advanced water-cooled machine that helps reduce etching and ashing time. The adjustable current density and advanced plasma power regulation ensure consistent results for all of the processes and steps. The tool operates with high-frequency production parameters, allowing the user to control the etching rate and the level of precision obtained. Its safety features ensure that all process end points are correctly concluded. The precision etching and ashing film on the wafer is dependent on the machine's ability to precisely control the etching time, gas flow, and plasma power. TECHNICS Gigabatch 300M has multistep programming functions with multiple parameters and a high-resolution graphical user interface to ensure accuracy and consistency. The optimized point electrode power supplies provide stability, featuring an adjustable range of up to 100 watts, with the ability to store up to eight separate power profiles. The adjustable frequency allows for the asset to be operated in DC or AC mode without having to exhaust or vent unwanted gases. The chamber design features an upgraded version of the well-known Ultrapure Plasma Model, providing a uniform production environment for both etching and ashing processes. The improved chamber purges the plasma and the chamber wall while etching and ashing, allowing for consistent results without any gas depletion. PVA TEPLA Gigabatch 300M runs in manual or automated modes, and communicates with external devices via an Ethernet interface and SNMP communication. It has advanced safety features including a pressure-adjustable plasma exhaust equipment and an anti-electromagnetic pulse system to protect the equipment from electrical faults. Its extraordinary versatility allows for both long production runs and short time test processing. Gigabatch 300M is designed with industrial-grade components in order to ensure maximum productivity and reliability in a wide range of semiconductor production applications. This etching and ashing unit offers a highly reliable, highly accurate, and efficient method for producing high-quality semiconductor products.