Used QUESTER / ALCANTECH MAS 801 #293592866 for sale

ID: 293592866
Wafer Size: 6"
Vintage: 1990
Etcher 1990 vintage.
QUESTER / ALCANTECH MAS 801 is an advanced etcher/asher specifically intended for processes in the semiconductor industry. It is capable of delivering high precision etching and ashing of a wide variety of semiconductor materials including silicon, aluminum, silicon dioxide, and other conductive or resistive materials. QUESTER MAS 801 features a three-dimensional vacuum chamber, equipped with two ALCANopro Pulse RF and DC generators, allowing it to deliver very precise and uniform power distribution. This feature makes the unit particularly useful for etching processes, ensuring high precision and low particle levels. ALCANTECH MAS 801 also has a large ceramic etching chamber capable of handling a variety of chamber sizes, allowing customers to tailor the etching configuration based on the desired end product. MAS 801's etching capabilities are further enhanced by its precise gas flow control and monitoring equipment, enabling precise control of etching rate and sidewall profile. This precise control allows for higher levels of control and accuracy for the etching process, reducing defects and enabling higher throughput. QUESTER / ALCANTECH MAS 801 also contains an advanced exhaust filtration system, which gives operators the utmost control over the process. The highly efficient filters ensure that no cleanroom contaminants, such as oil and particulates, are expelled with the etching gas. This filtration unit also greatly reduces the noise level in the area and ensures operator safety. QUESTER MAS 801 has numerous safety features, including a self-locking safety door, a gas overpressure monitoring machine and an encased cooling tool. ALCANTECH MAS 801's cleverly designed cooling asset ensures that the etching chamber is cooled as quickly as possible, reducing the risk of accidents due to thermal shock. MAS 801 is a reliable, precise, and powerful etcher/asher. Its advanced features, both in etching and safety, allow it to be used in the most demanding of environments with minimal operator supervision.
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