Used RUIMING HESL012 #9356202 for sale

RUIMING HESL012 is an etcher/asher that uses plasma-enhanced chemical vapor deposition (PECVD) technology. This equipment is designed to produce oxide films, polysilicon films, and other thin film materials for integrated circuit applications. It has a metal tray area of 200mm × 200mm and a high frequency power source of up to 40KHz. The power source can be set to a maximum of 1080W and the gas system can be set for a maximum flow rate of 250 SCCM (standard cubic centimeters per minute). In addition, it is able to run multiple process modes such as plasma-etch mode, ion-etch mode, ion-dopant mode, and others. The PECVD etching process uses reactive or inert gas to create plasma by applying high frequency power at the chamber level. The gas is ionized and its chemical and physical activities break down the bonds between the substrate and the silicon dioxide layer to form a uniform and dense oxide coating. To create a sufficient oxide layer, several process parameters can be adjusted according to the desired results. These include the power level, pressure, gas flow, etc, which allow precise control over the film thickness, surface roughness, and other properties of the oxide. HESL012 etcher/asher also has vacuum pump, thermocouple, and temperature control features. The vacuum pump helps in the evacuation of the reaction chamber and enables it to function properly. The thermocouple measures the surface temperature of the substrate, while the temperature control unit adjusts the temperature inside the chamber to maintain the desired result. This etcher/asher is equipped with water cooling and air filtration systems that help in maintaining the temperature of the machine and providing a safe working environment. In conclusion, RUIMING HESL012 etcher/asher is a powerful and precise machine that incorporates advanced PECVD technology. It effectively takes care of etching and annealing tasks in producing high-quality oxide films and other thin-film material for integrated circuits. In addition to efficient processing of micro-scale structures, it also provides excellent safety features.