Used SAMCO ICP -RIE-212ip #9135826 for sale

SAMCO ICP -RIE-212ip Etcher/Asher is an advanced etching device designed for high-precision etching of deposition and metal masking operations. This device is a hybrid etching / ashing technology, combining plasma etching techniques with the ability to use reactive ion etching (RIE). This technology is ideal for many device fabrication applications and allows for high levels of precision and accuracy when etching or ashing. ICP -RIE-212ip has a number of unique features to help with accuracy, repeatability, and performance. These features include a V-groove etchant chamber, adjustable chamber temperature, a quartz window to monitor etch progress, and a remote ion source for controlling etching uniformity. This etcher/asher is also compatible with a wide range of source gases and can be configured to run with either a straight or bent showerhead design. SAMCO ICP -RIE-212ip has a number of features to help ensure safety and user comfortability. These features include a RF impedance matching equipment, safety interlocks, and an exhaust manifold that allows up to 95% of by-products to be expelled from the etching chamber. Additionally, this device is equipped with a dual-stage vacuum pump, ensuring a consistent etching rate and process fidelity. Those looking to use ICP -RIE-212ip Etcher/Asher for their etching or ashing needs will be happy to find that it is user-friendly and easy to operate. The device is set up as a standalone system in an integrated hands-free laser etch chamber, with an easy-to-use HMI control unit. Furthermore, the device is outfitted with an intuitive software machine for both etch chamber operation and cycle programming, allowing for maximum control and ease of use. Overall, SAMCO ICP -RIE-212ip Etcher/Asher is a powerful device designed for high-precision etching and ashing operations. Its advanced technology, safety features, and user-friendly setup make it an ideal choice for those looking for precise results without sacrificing safety. With its intuitive software tool and adjustable parameters, this device allows for maximum control, accuracy, and repeatability of etching and ashing operations.