Used SAMCO RIE-10N #9014948 for sale

SAMCO RIE-10N is a single-chamber plasma etcher tool that utilises Reactive Ion Etching (RIE) for ultra-precise material removal. The equipment is characterised by its compact footprint and high etch rates, and is capable of processing most routine etching applications, such as photoresist stripping, dielectric removal, isotropic silicon etching and more. RIE-10N is equipped to handle a wide range of substrates including silicon, quartz, aluminium and a variety of metallization materials. The system is designed to be highly efficient, enabling users to complete their desired etching process in less than half the time taken by conventional systems. It also incorporates a one-step recipe creation for repeatable, consistent results as well as an intuitive graphical user interface. The tool features a source chamber, a pumping unit and a wide range of gas delivery systems for controlling the flow of protective gases. It also includes an ion source for generating plasma, a beam accelerator to channel the ions into the chamber as well as a sputtering source to complete the etching process. The machine can be configured with various plasma etching and sputtering processes, including inductively coupled plasma (ICP) and dielectric etching. SAMCO RIE-10N provides users with advanced features such as auto-calibration of the plasma parameters to attain repeatable repeatability. It also features an auto-tune function for achieving downtime and cost savings, while also minimising the risk of contamination from destructive particles. Other features include an auto-select program for optimising the reactive ion etching process, as well as a double wall chamber construction for a clean environment. RIE-10N is equipped with a high precision, bi-directional drive motor for rapid, precise and repeatable movement of the worktable, minimising strip width and reducing accidental damage to the chamber. It also utilises a high performance gas delivery tool to provide long-term stability and uniform results. The stand-out feature of SAMCO RIE-10N is the advanced temperature control, which ensures that etching processes take place at consistent temperatures to achieve excellent process repeatability. This is especially important when processing delicate and challenging materials such as photoresist, polyimides and organic materials. Overall, RIE-10N is a robust and reliable etch tool that guarantees reliable and uniform etching results. All of its features work in harmony to ensure accurate and repeatable process results every time, making it an ideal solution for advanced etching jobs.