Used SAMCO RIE-10N #9407762 for sale

SAMCO RIE-10N is an etching and ashing equipment used primarily in the manufacture of silicon chips. It can rapidly remove photoresist and other surface contaminants from silicon substrates. The system allows precise control of parameters such as etching rate, wafer temperature, pressure, gas flow rate, and gas mixing ratios. It is designed to meet the need for high throughput production, while providing repeatable, uniform etching and ashing results. RIE-10N is designed to offer flexible operation and easy maintenance. Its design is modular, allowing easy access to components and quick replacements. It is constructed using aluminum frames, humidity and temperature control systems, and stainless steel perforated trays for easy maintenance. Its features include a real-time etching rate monitor, temperature & pressure control unit, a microprocessor-controlled gas-flow control machine, and microprocessor-controlled gas-flow mixing ratios. SAMCO RIE-10N comes equipped with a rotary table for easy transfer of substrates within the vacuum chamber. Its flexible cassette loading tool allows for up to 10 cassettes to be loaded at one time, and transferred to the RF generator for substrate processing. Electrical power control is also provided, and the asset can process single wafers up to 8" in diameter. The RF generator is designed to offer precision and flexibility in substrate processing, while providing repeatable results. RIE-10N has the capability to process pretty much any silicon substrate, including heavily doped substrates and substrates with multiple layer structures. It offers precision etching of both surfaces, as well as improved device isolation, yield, and dielectric strength. The model's easy-to-navigate user interface allows for both manual and automated operation, as well as multi-mode operation. SAMCO RIE-10N provides safety through its fan cooling equipment, leak-proof gas seal valves, tamper-proof switches, and over temperature or over-pressure detection systems. Built-in diagnostic systems monitor all parameters during operation, providing real-time data for greater accuracy and precision. RIE-10N is the perfect tool for applications such as MEMS fabrication, microelectronics etching and ashing, power device metal etching, and TEG process etching (Thermal Expansion of Glass).