Used SAMCO RIE-10NR #293656751 for sale

SAMCO RIE-10NR
Manufacturer
SAMCO
Model
RIE-10NR
ID: 293656751
Wafer Size: 8"
ICP Etcher, 8".
SAMCO RIE-10NR is a reactive ion etcher (RIE) and asher designed for production and research applications. Building upon the success of SAMCO previous RIE10-TF model, SAMCO RIE 10 NR more than doubles the etching and ashing speed while providing simplified operation and maintenance. RIE-10NR has a vacuum chamber with a maximum size of 200 mm × 200 mm, making it ideal for a range of sample sizes. It is equipped with dual RF sources that generate up to 800 W of power for etching and an additional 500 W for ashing. This makes it suitable for a range of materials, including silicon and metals. The etching process is monitored by Endpoint Detection, a feature that accurately determines the end of etch operations. RIE 10 NR also has an automatic jet control feature that adjusts the flow of etchant, scrubbing the chamber walls and improving etch uniformity. The etch is achieved with a refillable, liquid SnCl2 solution that prevents debris accumulation in the chamber and maintains the temperature of the system. This reduces the presence of impurities and allows for high etch selectivity and uniformity. The chamber is interfaced with a forward-looking optical viewport, which allows monitoring of the etching process and enables quick camera inspection of the etched samples. SAMCO RIE-10NR also offers a low-profile modular design that integrates the valve stack, roughing pump, and controller below the optical viewport. This eliminates the need for external wiring, saving time and cost during maintenance. For advanced applications, SAMCO RIE 10 NR can be equipped with an additional high-frequency source for shallow trench isolation. Additionally, the system can be upgraded with a range of accessories, such as a turbo pump, side-view camera, and sputter ion source for increased versatility. In summary, RIE-10NR is a powerful and reliable system for both production and research etching and ashing. Its dual RF source, Endpoint Detection, and automatic jet control provide the accuracy and precision needed for advanced processes, while its low-profile and modular design offers cost and time savings over other RIE systems.
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