Used SAMCO RIE-1C #293753913 for sale

SAMCO RIE-1C is a Reactive Ion Etcher (RIE) designed and manufactured by SAMCO Inc. It is an inductively coupled plasma asher / etcher that delivers a reliable and repeatable process for etching organics, dielectrics, photoresist, and polymer-based materials. It is a general purpose RIE and its features include large chamber capacity (226mm diameter × 135mm deep), uniform etching uniformity (±2%), low power consumption, and high-speed operation. RIE-1C has a number of key components that contribute to its performance. The chamber is composed of a vacuum-sealed stainless steel enclosure with windows for viewing. Its gas delivery equipment includes a vacuum pump, pressure gauges, and mass flow controllers. It is equipped with a gas diffusion chamber to evenly mix and direct gas flow. The cooling system consists of an inert gas package to keep the interior temperature uniform over the wafer size. The plasma generator provides an electronically controlled DC HF source of up to 1625W. SAMCO RIE-1C also has safety and control features for protecting users, operators, and the machine. This includes an emergency stop button and a power meter for monitoring plasma power output. The process control unit allows for detailed process control of the etching parameters such as pressure, gas flow, and power. The machine also includes an intuitive user interface for programming recipes and monitoring process parameters. RIE-1C is well-suited for a wide range of etching applications, ranging from cleaning contaminated surfaces to removing unwanted deposition. Its compact size and high efficiency make it ideal for use in industrial, high throughput, and laboratory settings. This etcher is suitable for use in both wafer-level and mask-level processing. Etching results can be evaluated via photo imaging and optical review systems. It is also capable of generating highly uniform features, superior selectivity, high aspect ratios, and reduced critical dimensions (CD) variation. Overall, SAMCO RIE-1C is an efficient and reliable asher / etcher. It is highly versatile and capable of producing reliable and repeatable results with a wide range of commonly used materials. The safety features and intuitive user interface make it an ideal choice for a range of etching processes. Additionally, its large chamber capacity, uniform etching uniformity, and high-speed operation make it a good solution for high throughput and laboratory applications.