Used SAMCO RIE-200iP #9157972 for sale

SAMCO RIE-200iP is a reactive ion etcher (RIE) that has been designed for the dry etching of semiconductor compounds. It is an etcher with high etching uniformity and repeatability, making it suitable for a wide range of etching applications. RIE-200iP is a self-contained system, with all necessary components including a 6" x 6" chamber, process gas flowlines, and an ejecting power supply, as well as computer tools and an open-loop control system. This etcher has a 6" x 6" chamber with an underbar surface that provides a uniform gap between the wafer and the power supply at the time of vacuum processing. This ensures absolute etching precision. The pressure and flow of gas can be adjusted depending on the etching material and the desired design. This is controlled by SAMCO pro3 software, which can be used to set the specific parameters for etching, such as bias voltage, flow rate of process gas, and temperature. SAMCO RIE-200iP also features a 2 stage power supply system. The 1st stage consists of a voltage clamping circuit which keeps the power supply voltage stable, thus providing high uniformity in the etching process. The 2nd stage is an E-gun, which comes with a focusing lens, allowing for the acceleration of ions to increase the etching rate. Additionally, the etcher has an active surge protection function, avoiding electric shock and protecting the operator during operation. RIE-200iP also features a speed-filter, designed to minimize status gas and material damage. It is capable of working with different gases such as chlorine-based plasma, fluorine-based plasma, and oxygen-based plasma. The etch rate can be adjusted easily, making it a versatile tool for different etching needs. Overall, SAMCO RIE-200iP provides an efficient and accurate environment for etching semiconductor compounds. With its easy-to-use design, precise etching uniformity, high repeatability, and surge protection, this etcher is a powerful device for a variety of etching applications.