Used SAMCO RIE-200IPC #9287082 for sale

Manufacturer
SAMCO
Model
RIE-200IPC
ID: 9287082
ICP Etcher.
SAMCO RIE-200IPC is a reactive ion etcher (RIE) for producing highly reproducible, high accuracy etching features in a wide variety of materials. It is suitable for use in the production of integrated circuits (ICs), magnetic recording heads, MEMS, precision optics, and optoelectronics. RIE-200IPC is a fully automated, high-end etching equipment, designed to achieve extremely accurate and consistent results due to a combination of advanced technologies and precise process control. It operates under high vacuum conditions to achieve clean etching results without undercutting, dielectric etching, or surface contamination. Its high-precision, high-throughput automation system ensures repeatable etching features with a resolution of 0.2-98.0 microns. Additionally, its advanced embedded software optimizes etching strategies to continuously monitor the etching process to prevent any deviation in the results. SAMCO RIE-200IPC comes with coaxial shielding of process chamber walls to minimize surface charging, a high-quality vacuum unit for complete removal of process gases, and an efficient ETCH DISK O3 generator for improving the success rate of O3 processes. Moreover, the machine also contains a highly reliable, automatic substrate transfer tool for loading and unloading of substrates with a maximum size of 12"×12". Furthermore, RIE-200IPC is constructed with an inert aluminum alloy process chamber for longer equipment life, a modularized cleaning and maintenance asset, and a smart digital communications interface. It is equipped with an intuitive graphical user interface for the configuration of etching recipes, monitoring of the model's operation, and data acquisition for further analysis. This equipment also supports the peripheral devices for automatic loading and unloading of substrates, gas delivery, exhaust treatment, and emission monitoring. SAMCO RIE-200IPC delivers reliable and repeatable performance for etching of a wide range of materials, including metals, oxides, nitrides, plastics, and many others. It is highly suited for fabricating small-scale, high-accuracy features, and for large-scale production etching applications. Overall, RIE-200IPC is a powerful, versatile, and automated reactive ion etching solution, delivering superior etching results with minimal throughput times.
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