Used SAMCO RIE-200IPC #9375019 for sale

SAMCO RIE-200IPC is a reactive ion etcher (RIE ) designed for various kinds of semiconductor and electronic devices. It has dual beam Plasma Processing Unit and has a wide range of applications. It is used for process gases such as chlorine, boron trichloride and oxygen to manufacture devices such as thin film transistors and other elements of microelectronic devices. RIE-200IPC can be used for etching metals, insulators and polymers. This etcher has a wide ion energy range of 0.1 to 4.0keV, a wide range of process pressure of 0.2 to 8.0 mTorr, a wide chuck temperature range of 10 to 400℃, and a wide range of power from 0.1 to 3.0 kW. The equipment also features a high power input frequency of up to 200kHz. This etcher is equipped with a magnetic bias system and a powerful LEF-32™ computer system, which are used for optimization of etching processes. SAMCO RIE-200IPC is able to provide high etching rates and uniform patterns, making it ideal for precision microelectronic device manufacturing. The advanced wide spectrum plasma source is designed to reduce particle discharging and improve etch uniformity, and the control system facilitates precise control of etch parameters and easy adjustment. Additionally, the advanced linear transfer robot and design ensures high-quality samples, allowing for repeatability of processes. This etcher is able to provide various etch processes, such as dry etching, wet etching, over etch, and high aspect ratio etching. The etch profile is highly dependent on process parameters including gas type, pressure, power level, and ion energy, among others. Moreover, the design of the etcher allows for a multi-step etching process where different etch parameters are used for different depths in materials. This etcher is particularly useful for advanced MEMS device manufacturing due to its precise control and additional etch processes. In summary, RIE-200IPC is a versatile etcher equipped with various features, such as dual beam Plasma Processing Unit, a wide range of gas types, and a wide range of process parameter. It can be used for etching different materials, such as metals, insulators, and polymers. In addition, this etcher can provide various etch processes for precision device fabrication and is suitable for MEMS device manufacturing.