Used SAMCO RIE-200NL #293638507 for sale

Manufacturer
SAMCO
Model
RIE-200NL
ID: 293638507
Vintage: 1999
Reactive Ion Etcher (RIE) High frequency power supply: 13.56 MHz, maximum 300 W Crystal Oscillation control solid state type Impendence auto-matching Digital display in the touch panel Compound molecular pump Type: N2 Purge line with auto leak line auxiliary Direct connection type (rotary pump): 208 liters/min Automatic pressure control valve, 4" Perot seal air operated valve SUS316 Piping Pipe connection joint: 1/4" VCR Welded Mass flow controller: MFC Line / Gas / Flow MFC 1 / SiCi4 / 50 SCCM MFC 2 / CF4 / 100 SCCM MFC 3 / SF6 / 100 SCCM MFC 4 / SF6 / 100 SCCM MFC 5 / O2 / 100 SCCM 1999 vintage.
SAMCO RIE-200NL is a reactive ion etcher/asher for a wide range of surface preparation and etching operations. It is a versatile equipment that can be used to accomplish a variety of applications from small batch to high precision etching. This etcher/asher is designed to provide good process repeatability and excellent feature resolution in order to produce consistent, high-quality results. It is suitable for any type of material, such as polysilicon, amorphous silicon, glass, and metal. This system is based on a double chamber design, with the etching chamber and the ashing chamber connected together by a single pump and set of sensors. This allows the user to switch between etching and ashing with just a few clicks. The main chamber is equipped with a remote plasma source, which can be placed in any position to optimize the etching process. The etching chamber is further equipped with a cylindrical glass window, a bellows vacuum seal, and a cooling jacket for stabilizing and controlling the temperature of the process. Inside the etching chamber, RIE-200NL utilizes etching gases to break down and deposit material from the surface of the substrate. The etching process can be optimized using various parameters such as etch rate, selectivity, inductivity and layer thickness. The unit is capable of producing high-density sub-micron features with excellent repeatability, making it ideal for high-precision applications. SAMCO RIE-200NL can also be further enhanced with additional accessories such as shadow masks, liners and spacers, as well as secondary processing capabilities such as heating and cooling. The ashing chamber is used to remove carbon and dust particles, and is designed with a built-in plasma source to ensure optimum particle removal. Both etching and ashing processes can be monitored and controlled using an on-board computer, as well as from a remote location. In addition, all parts can be easily accessed for maintenance and repair work. The machine also includes an optional real-time, non-contact temperature monitoring tool for further process optimization. Overall, RIE-200NL is an effective and reliable etcher/asher that offers excellent precision and repeatability. It is capable of producing high-end results with great precision and efficiency, making it an ideal choice for a wide range of surface preparation and etching operations.
There are no reviews yet