Used SAMCO RIE-212ip #293760254 for sale

SAMCO RIE-212ip is an advanced reactive ion etching (RIE) system designed for sensitive etching applications. It is well suited for applications ranging from semiconductor fabrication to biomedical engineering. RIE-212ip is equipped with a 12-inch wafer size capability, making it an ideal choice for any application requiring higher throughput. It features high-precision optical components for accurate positioning of the etching process and can process five etching gas service lines with up to two independent vacuum chambers. The user interface of the machine allows for accurate control of etching parameters and provides real-time monitoring of process conditions. SAMCO RIE-212ip is capable of operating at temperatures up to 200°C and can handle a large variety of precise etching processes. The concurrent flow of two process gases for low temperature etching is possible through the chamber, making it an ideal choice for processing aluminium, silicon, and titanium alloys. The adjustable total pressure within the etcher also allows for tight control over etching during the process. The highly accurate direct drive stepper motor used in RIE-212ip makes it capable of excelling with process repeatability and accuracy. The motor features a glass encoder that reads horizontally and vertically, making the machine adaptable to a variety of etching applications. The machine's bottom anti-reflective coating filter prevents light reflection during etching, minimizing light scattering and improving process accuracy. SAMCO RIE-212ip is designed with a two-cassette wafer elevator and adjustable wafer chuck for convenient wafer loading and unloading, providing significantly improved efficiency and productivity. The machine's build-in sensors allow it to automatically detect device/wafer substrate events, ensuring safety and operator comfort during the etching process. RIE-212ip's intuitive operating system and graphical user interface highlights the performance of the machine, making it user-friendly and allowing for efficient production. The system's diagnostics capabilities also enhance its usability, making the machine a high-performance choice for any sensitive etching application.