Used SAMCO RIE-212iPC #293587430 for sale

SAMCO RIE-212iPC is a state-of-the-art etcher and asher that can be used for a wide variety of etching and ashing processes in semiconductor semiconductor. This equipment is an advanced, miniaturized, and highly reliable etcher and asher system that is designed to allow for high accuracy and control of etching and ashing processes for semiconductor manufacturing. SAMCO RIE 212 IPC features a variety of features and benefits, such as a oxidation-etching capability, a hermetic ultra-clean chamber, and an ultra-high-resolution surface view window. The oxidation-etching capability of this unit enables the etching and surface preparation of a wide range of materials and process nodes with a higher degree of accuracy and throughput. The hermetic ultra-clean chamber ensures that the process environment remains contamination-free, while the ultra-high-resolution surface view window allows the operator to closely monitor the progress of the process. RIE-212iPC also features a Helmholtz-based gas delivery machine, which allows gases to be accurately and precisely delivered and controlled for optimal etching and ashing performance. The gas delivery tool is composed of a multiphase gas regulation valve, a passive gas preheater, and a passive gas purifier that have been incorporated into the chamber to optimize both the temperature and pressure of the process. RIE 212 IPC also features a multi-level variable power source that provides a wide range of power levels for etching and ashing processes. The variable power source is composed of a Pulse-Power Impedance Matching (PPIM) asset that optimizes the power to depth ratio of the etching and ashing processes. Additionally, the variable power source is designed with an ion filtration model that enables higher power densities while reducing the formation of undesired etch products. SAMCO RIE-212iPC is also comprised of an advance process control equipment that provides real-time monitoring and control of the process parameters. With this advanced process control system, users can access a variety of etching and ashing process recipes, set up multiple process parameters, monitor the progression of the process, and troubleshoot process related issues. In conclusion, SAMCO RIE 212 IPC is a state-of-the-art etcher and asher that is designed to facilitate the etching and ashing of semiconductor materials with high accuracy and throughput. This unit features a variety of features and benefits, such advanced process control, a hermetic ultra-clean chamber, a Helmholtz-based gas delivery machine, and a multi-level variable power source, making RIE-212iPC a highly efficient and reliable etcher and asher tool that is ideal for semiconductor manufacturing.