Used SAMCO RIE-212iPC #293587431 for sale

SAMCO RIE-212iPC is an advanced Reactive Ion Etching (RIE) equipment that offers high-precision etching for a variety of materials. It is used to amplify micro- and nano-structures in a wide range of applications such as microelectromechanical systems (MEMS), semiconductor device fabrication, and display cell manufacturing. The system is an efficient and cost-effective tool for high resolution etching of a wide range of materials, such as silicon, germanium, gallium arsenide, aluminum, and polymers with excellent etch uniformity and accuracy. SAMCO RIE 212 IPC is built with a 600 mm x500 mm main chamber for large quantities of substrate to be etched and a 200mm x150 mm side chamber for smaller wafers and samples. Its working pressure range is from 50 mTorr to 400 mTorr and includes a built-in titanium getter vacuum pump that provides an extreme pressure of 0.1 mTorr or better. The etcher chamber is made of stainless steel, with a 140 W heating element and a temperature range of 0-200°C. The unit also features a digital wheel control to set the etch pressure, flow rate, and time. RIE-212iPC offers precise solutions for etching with ultrahigh-resolution and repeatable results. It features precise uniformity in all areas of the substrates, low residue levels, and enhanced dielectric etching. It uses an advanced computer machine to control all of its functions, such as etch recipes that can be programmed for accurate and repeatable results. It also includes a gas delivery tool with security sensors and a remote control pad. RIE 212 IPC is ideal for those seeking precise and repeatable etching for a variety of materials and applications. Its precision and low level of residue allows for excellent polishing and an overall finish. It is also extremely easy to program and operate, making it a great choice for laboratories, research facilities, and other areas that require precise etching solutions.