Used SAMCO RIE-212iPC #293587433 for sale

SAMCO RIE-212iPC etcher/asher is a plasma etching and ashing equipment designed for nano-scale machining and material surface processing applications. The system combines Remote Inductively Coupled Plasma (RIEC) and radio-frequency (RF) source technologies for an extremely high level of control and accuracy. This allows for nanoscale precision with a fraction of the power consumption of traditional etching/ashing systems. The unit comes with an integrated vacuum chamber that allows for rapid and efficient evacuation of the machine prior to etching/ashing processes. It features a process time of less than three minutes depending on the size and complexity of the job. With a maximum temperature of 154°C and a low temperature of -50°C, this tool is ideal for a variety of etching/ashing processes. The asset has a large etching area of 160mm x 160mm, which is ideal for etching large parts quickly and efficiently. It allows for multiple etching recipes to be saved and recalled through the user-friendly graphical user interface (GUI) for quick and easy etching of large parts. Additionally, the model features a low-air-pressure etching mode for increased etching accuracy and surface finish quality. SAMCO RIE 212 IPC also includes a sophisticated RF-source power supply and generator, allowing for stable and controlled etching processes. By using this generator, the equipment can etch at a low power and with an excellent repeatability. It also allows for high-power plasma etching using up to 700W peak power. Finally, this system offers amazing safety features for operators, with it being completely enclosed and accessible only from a maintenance panel on the outside. Additionally, the unit has a built-in pressure monitor to detect any immediate changes in the pressure, giving operators a warning of when to stop the process and take action. In conclusion, RIE-212iPC is a powerful, reliable and safe etching/ashing machine ideal for a variety of substrate and material surface processing applications. With its high level of control and accuracy, low power consumption and versatile RF power supply, it is perfect for Nano-scale etching/ashing.