Used SAMCO RIE-212iPC #293761450 for sale

SAMCO RIE-212iPC is an etcher and asher that is best suited for high precision atmospheric-pressure reactive ion etching and ashing, which is commonly used in semiconductor fabrication. The device is fully automated and contains various process parameters to deliver superb etching quality and cost efficiency. The etcher features a large high vacuum chamber with a 200 cm3 capacity, enabling large batches and reduced processing time. High vacuum performance is ensured by a two-staged roughing pump and a refined turbo molecular pump. A simple, intuitive user interface can be used for controlling the automated equipment, including pressure control, process gas control, and application of high voltage. It also incorporates a rotating electrode holder that ensures uniform etching results on all surfaces. The device also has a High-Power Source Control feature, which allows advanced processes such as high speed etching and a high degree of accuracy. Depending on product requirements, the etcher can use a variety of gases such as O2, CF4, Ar and SF6. In addition, it incorporates a supply control voltage up to 2,000V with an accuracy of +/- 0.5%. The in-built safety feature of the device ensures its safety as well as the safety of the surrounding environment. This includes an arc detection system, a monitoring unit, an emergency stop machine and a gas detection tool. In addition, the device is equipped with a temperature monitoring asset that can be used to monitor the temperature of the process chamber and its components, which helps reduce any process-related damage. In summary, SAMCO RIE 212 IPC etcher and asher is designed for high precision atmospheric-pressure reactive ion etching, delivering superb performance with automatic process control and a range of safety features. The large capacity of the device allows for improved performance and reduced processing time.