Used SAMCO RIE-212iPC #9189842 for sale
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SAMCO RIE-212iPC is an etcher / asher designed for complex processing of thin and thick film materials. It is capable of etching and ashing different polymers, dielectrics, ceramics, metals, and other materials. This powerful unit is designed to provide uniformity in etch and ash processing and is suitable for a variety of semiconductor industries. SAMCO RIE 212 IPC includes an integrated plasma source as well as a gas bypass with an ASIC-controlled high power gas delivery system. The plasma source has a motor-driven chamber and a cold section to reduce gas temperature over time. This unit is equipped with a graphical user interface for easy operation. It also has a rear-mounted hydrogen and oxygen system, which includes an exhaust filter. The etcher / asher is capable of etching and ashing with either a fixed or adjustable temperature range with a maximum chamber temperature of up to 1000℃. The machine can also process a wide variety of materials, including oxidized silicon, silicon nitride, amorphous silicon, aluminium, titanium nitride, ITO, and more. RIE-212iPC is designed with an integrated airtight, titanium-shielded chamber, which provides excellent engineering accuracy and repeatability. The unit also ensures uniform etching and ashing with high-precision Z-axis and wafer tilt control. It has a built-in diagnostics system that monitors the process parameters in real-time for improved accuracy, stability, and repeatability. The Unit also comes with a wide range of materials that can be used in the machine, including silicon oxide, tantalum nitride, gold, aluminum nitride, copper, and various non-silicon materials. It can also be used for low-pressure processes, which are useful for a range of advances processes that require high power and low pressure. Overall, RIE 212 IPC is a reliable and accurate etcher / asher that can be used to process a wide variety of materials. It has advanced features that offer precision and repeatability, as well as integrated safety features that ensure a safe operating environment. The unit comes with a wide variety of materials that can be used for high power and low pressure processes, making it a great choice for semiconductor and electronic applications.
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