Used SAMCO RIE-300NR #293804464 for sale

Manufacturer
SAMCO
Model
RIE-300NR
ID: 293804464
Vintage: 2013
Reactive Ion Etcher (RIE) 2013 vintage.
SAMCO RIE-300NR is an etcher/asher, specifically a reactive ion etcher (RIE), used for high precision microfabrication. This industrial grade tool offers superior performance, enabling users to consistently fabricate parts with high surface accuracy. SAMCO RIE 300 NR is a low-cost, reliable device designed for use in many different industries, including microelectronics, biotechnology laboratories, and more. The device features a vacuum chamber, powered by an 85 m3/hr turbomolecular pump which is capable of achieving a base pressure of 2x10^-3 Pa or lower. This enables users to perform etching and ashing processes with extremely high precision. The controls are highly intuitive, with a 5.7" color LCD touch panel to enter commands and display information. The high-performance computer-based operating system further simplifies control. Unlike most RIE systems, RIE-300NR features an inline CCD camera system for online monitoring of processes. The camera is connected to a microscope with 5x, 10x, and 20x magnification, enabling users to observe the process in progress. By monitoring the process, users can easily adjust parameters for optimal performance. RIE 300 NR is equipped with the patented XCEL® plasma source, allowing users to generate highly reactive plasmas with exceptional plasma uniformity and low ion energy spread. Furthermore, the device includes a unique wafer alignment system for higher processing accuracy and reproducibility. Its process gases are delivered by a combination of mass flow controllers and metering valves with an accuracy of +/-0.5%, minimizing the impact of gas flow rate on processing results. The gas systems also feature a pressure profile control function that permits users to profile the gas pressure inside the chamber. This function ensures that the reaction is optimized for whatever type of materials being etched. SAMCO RIE-300NR ultimately offers superior performance for the microfabrication of different materials with extreme accuracy and repeatability. Its high-end features provide users with unparalleled control of the etching process, ensuring consistent results each and every time.
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