Used SAMCO RIE-300NR #9249082 for sale

SAMCO RIE-300NR is a high-performance, reactive ion etcher (RIE). This advanced etching and ashing tool is located in a tight, sealed enclosure and is designed to precisely pattern materials such as silicon, gallium arsenide, and aluminum with an accuracy of up to 0.1 microns. It also features a hydrofluoric acid vapor cleaning equipment, an automated pressure control system, and a dry running-bypass mode for reduced downtime. SAMCO RIE 300 NR offers the best of both worlds by combining both etching and ashing in one unit. It features a large chamber size that is capable of handling substrates up to 10" in diameter. RIE-300NR also has a variety of chamber and wafer holding configurations to fit different project requirements. Its high-purity Poly-Freon gas delivery machine helps to maintain high throughput and consistent etch rates over a wide range of processes. RIE 300 NR is an ideal choice for producing small and complex features because of its advanced plasma control systems and ellipsometer capabilities. SAMCO RIE-300NR can help achieve a wide range of process parameters with the help of its in-situ end point detection, radio frequency generator, and capacitively coupled chamber. In addition, SAMCO RIE 300 NR's built-in exhaust port gives users the freedom to run unbalanced processing inside the chamber without venting any plasma or Coriolis forces. RIE-300NR is an ideal choice for photomask repair and wafer backside etch cleaning applications. This advanced etcher and asher is perfect for processing all types of materials, including silicon, gallium arsenide, and aluminum. It is also capable of etching bevel angle and undercut profile profiles with an accuracy of up to 0.1 microns. RIE 300 NR offers the highest level of performance with its automated pressure control tool and dry running-bypass mode for reduced downtime.