Used SAMCO RIE-331iPC #293807454 for sale

SAMCO RIE-331iPC is an Inductively Coupled Plasma Etching Equipment that is designed for small-scale production of high precision sample parts. The system utilizes a patented etching process to provide precise etching and superior surface finish on a wide variety of materials. The unit features an advanced CNC controller with a fully automated Multi-axis wafer stage, which allows for precise positioning and accurate etching of delicate sample parts. It has an integrated planetary handling table that can efficiently manage up to two 8-inch wafers or two 4-inch wafers. The integrated design of the machine allows for efficient and reliable etching without fear of contamination of samples by unwanted chemicals. The tool has an integrated tactile feedback asset that provides a visual cue when the desired etching process has been completed. Through its touchscreen interface, a user can monitor etching performance, pause, or adjust etching parameters as needed. Model parameters like etching rate, beam current, RF power, pulse width, space ratio, and more can be easily changed and manipulated to achieve the desired results. In addition, temperature, pressure, and chamber vacuum can be controlled, making for a reliable and controlled etching process. The equipment also provides an on-board, high-resolution imaging system which captures and stores the sample parts before, during and after etching. This feature allows the user to visually compare progress and analyze areas that need improvement or fine-tuning. The user can also compare specimens and experiment with different etching parameters to achieve the desired results. RIE-331iPC is a reliable and customizable etching unit which offers a fast and simple yet comprehensive way to fabricate precise samples. With its advanced technology and intuitive touchscreen control, users of all levels of expertise will be able to master the machine and produce precise components with superior surface finishes.