Used SAMCO RIE-331iPC #9412284 for sale

SAMCO RIE-331iPC is a fully automated Reactive Ion Etching (RIE) device designed for the precise physical etching of various substrates for various industrial applications. The electrochemical etch process facilitates the formation of highly precise and delicate patterns on the wafer surface. RIE-331iPC is designed for maximum performance, with a state-of-the-art ion source, high accuracy wafer position sensors, and automated pressure feedback equipment which accurately regulates substrates processes. Thanks to its efficient gas distribution system, the etcher is capable of delivering controlled and consistent etching results with minimal gas consumption. The etcher is suitable for etching a wide variety of material substrates including silicon, silicon oxide, silicon nitride, copper, copper alloys, aluminum, ceramic and polymer. It supports etching parameters including etching time, pressure, and gas flow, so that these can be adjusted for various applications or for custom processes. SAMCO RIE-331iPC is also equipped with an automated substrate position detection unit, which guarantees accurate etching and outstanding yield. The device offers advanced safety measures, such as a dual-chamber panel design and ion-source monitoring, which ensure safety and reliability both during etching and during maintenance routine. Moreover, the etcher comes with an integrated software package, allowing users to monitor and control the machine with ease. In conclusion, RIE-331iPC is a top-of-the-line etcher that is ideal for applications requiring highly precise, delicate patterns. With its easy-to-use integrated software, efficient gas distribution machine, automated pressure feedback tool and advanced safety features, SAMCO RIE-331iPC is the perfect tool for a wide range of industrial applications.