Used SEMI GROUP 2000 PP #9184464 for sale

Manufacturer
SEMI GROUP
Model
2000 PP
ID: 9184464
Reactive ion etcher.
SEMI GROUP 2000 PP is a user-friendly, reliable etcher and asher equipment for use in the semiconductor industry. It is designed for high quality and precision etching and ashing of on-chip materials used in semiconductors. The system has a robust auger-based processing chamber, digital high-frequency generator, multi-baffle technology with variable power control, and a real-time pressure control. 2000 PP offers a simple and easy-to-use graphical user interface that enables precise control over etching and ashing process parameters. With this unit, the operator is able to monitor and control several different parameters like plasma power, wafer temperature, and chamber pressure. In addition to being able to precisely control these parameters, operators can also adjust the etching rate to match specific requirements. The digital high-frequency generator included in the machine helps to ensure that the plasma in the etching and ashing process is uniform and controlled. This helps to improve the quality of the parts being etched and ashed. The multi-baffle technology with variable power control helps to prevent any stray plasma from affecting the etching and ashing process. The real-time pressure control ensures that air pressure is constantly regulated during processing. In addition to being user friendly and precise, SEMI GROUP 2000 PP also offers highly repeatable results with every etching and ashing cycle. This ensures that parts produced with this tool can meet strict quality standards. The asset is also designed to be low-maintenance with an onboard diagnostic model making it easy to identify and troubleshoot any potential problems. Ultimately, 2000 PP is a reliable, high quality etcher and asher equipment for use in the semiconductor industry. The robust auger-based processing chamber, digital high-frequency generator, multi-baffle technology with variable power control, and real-time pressure control make this an ideal system for precise etching and ashing of on-chip materials.
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