Used SES MU-0712-01-02 #9284128 for sale

SES MU-0712-01-02 etcher is a piece of high-performance reactive ion etching equipment developed by Semes Corp. Specifically designed for use in the fields of physics and material science, MU-0712-01-02 utilizes advanced atmospheric pressure ion etching technology. This technology relies on the energy released when an electron beam is induced with an RF (radio frequency) field. This process enables a fine etching results with a very low ion energy, hence ideal for the etching of sensitive devices such as compound semiconductors and nanostructures. The etcher comes equipped with several features that make it the perfect tool for physics and material science. Experiments can easily be set up and adjusted using the intuitively designed user interface. The equipment is also equipped with wafer handling capabilities including wafer mapping, alphanumeric reference indexing, and barcode labeling. This enables precise aliquoting and identification of wafers. The system is also equipped with several advanced safety features that ensure reliable and safe operation of the etcher. The unit is capable of achieving high throughputs, thanks to its pressure control unit which allows the etcher to operate in different gas pressure ranges. This range can be adjusted manually or automatically, depending on the etching requirements. Furthermore, the temperature monitor on the machine assists in controlling the uniformity of the etching process. SES MU-0712-01-02 utilizes two different geometries to achieve precision etching, Through Focus Gaussian Beam and Off Focus Gaussian Beam. The former has a higher ion energy compared to the latter, hence enabling greater precision while etching. In addition, MU-0712-01-02 is equipped with three different pumping modules: diffusion, turbo and cryogenic. This configuration makes it possible to optimize the etching process for different applications, by providing various gas flow requirements and precisely controlling the pressure of the tool. Furthermore, the custom-made electrodes inside the etcher allow good etching uniformity and low sputter rates. SES MU-0712-01-02 etcher is designed for easy maintenance and low-cost operation, making it an ideal choice for laboratories, universities, and research facilities. Its high-performance features such as robust safety systems, intuitive user interfaces and precise etching capabilities make it the perfect etching equipment for research environments.